- pulsed ion source
- Макаров: импульсный ионный источник
Универсальный англо-русский словарь. Академик.ру. 2011.
pulsed ion source
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Ion source — An ion source is an electro magnetic device that is used to create charged particles. These are used primarily within mass spectrometers or particle accelerators.Mass spectrometry In mass spectrometry, an ion source is a piece of equipment used… … Wikipedia
Pulsed laser deposition — (PLD) is a thin film deposition (specifically a physical vapor deposition, PVD) technique where a high power pulsed laser beam is focused inside a vacuum chamber to strike a target of the desired composition. Material is then vaporized from the… … Wikipedia
Ion thruster — An ion thruster is a form of electric propulsion used for spacecraft propulsion that creates thrust by accelerating ions. Ion thrusters are characterized by how they accelerate the ions, using either electrostatic or electromagnetic force.… … Wikipedia
Ion laser — An ion laser is a gas laser which uses an ionized gas as its lasing medium. [GoldBookRef|title=ion laser|file=I03219] Like other gas lasers, ion lasers feature a sealed cavity containing the laser medium and mirrors forming a Fabry Perot… … Wikipedia
Secondary ion mass spectrometry — Infobox chemical analysis name = Secondary ion mass spectrometry caption =CAMECA IMS3f Magnetic SIMS Instrument acronym = SIMS classification =Mass spectrometry analytes = Solid surfaces, thin films related = Fast atom bombardment… … Wikipedia
Static secondary ion mass spectrometry — Static secondary ion mass spectrometry, or static SIMS is a technique for chemical analysis including elemental composition and chemical structure of the uppermost atomic or molecular layer of a solid which may be a metal, semiconductor or… … Wikipedia
Low-energy ion scattering — LEIS redirects here; for the Hawaiian garland see Lei (Hawaii). Low energy ion scattering spectroscopy (LEIS), sometimes referred to simply as ion scattering spectroscopy (ISS), is a surface sensitive analytical technique used to characterize the … Wikipedia
Plasma-immersion ion implantation — (PIII) [cite book | title = Materials Science of Thin Films | author = Milton Ohring | publisher = Academic Press | year = 2002 | isbn = 0125249756 | url = http://books.google.com/books?id=SOt yFjV xwC pg=PA267… … Wikipedia
Gas chromatography ion detector — Many GC detectors are ion detectors with varying methods of ionizing the components eluting from the GC s column.Principle of OperationAn ion detector is analogous to a capacitor or vacuum tube. It can be envisioned as two metal grids separated… … Wikipedia
Deep reactive-ion etching — (DRIE) is a highly anisotropic etch process used to create deep penetration, steep sided holes and trenches in wafers, with aspect ratios of 20:1 or more. It was developed for microelectromechanical systems (MEMS), which require these features,… … Wikipedia
Spallation Neutron Source — The Spallation Neutron Source (SNS) is an accelerator based neutron source being built in Oak Ridge, Tennessee, USA, by the U.S. Department of Energy (DOE). SNS is being designed and constructed by a unique partnership of six DOE national… … Wikipedia
